Название: Optical Lithography: Here is Why
Издательство: SPIE Publications
Автор: Burn J. Lin
Количество страниц: 473
Размер: 29 Mb
This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future.
The Meter of Lithography
Components in Optical Lithography
Processing and Optimization
Outlook for optical lithography
Посетители, находящиеся в группе Гости, не могут оставлять комментарии к данной публикации.